Materials Science Seminar: High-throughput Screening of Extreme Ultraviolet Photoresists using Molecular Layer Deposition

by Materials Research Community

Meeting *Free Food/Drinks Hybrid Seminar

Fri, Feb 6, 2026

1:30 PM – 2:30 PM MST (GMT-7)

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MCMR 205 & Zoom

1435 W University Dr, , Boise, ID 83706, United States

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Learn from David S Bergsman as he presents on "High-throughput Screening of Extreme Ultraviolet Photoresists using Molecular Layer Deposition" and his work at the University of Washington.

Join us on Friday, February 6 at 1:30 p.m. in MCMR 205. Light refreshments will be provided.

https://www.boisestate.edu/coen-materials/seminar/

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MCMR 205 & Zoom

1435 W University Dr, , Boise, ID 83706, United States

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Materials Research Community | Website | View More Events
Co-hosted with: College of Engineering

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